FIELD: plasma engineering.
SUBSTANCE: powerful plasma high-frequency ion sources used in atomic beam injectors. The RF power supply is connected to the antenna circuit, which is divided into two or three parts. In this case, the antenna circuit is inductively coupled to the plasma load. With this connection method, the inductance between the connection points and the total inductance of the oscillatory circuit have such a ratio that the active resistance of the oscillatory circuit coincides with the output impedance of the RF source.
EFFECT: increasing the efficiency of transfer of RF power to the plasma.
1 cl, 4 dwg
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