METHOD AND DEVICE FOR EXPOSING STARTING MATERIAL FOR PATTERN FORMATION Russian patent published in 2024 - IPC G03F7/20 

FIELD: printing plates.

SUBSTANCE: invention relates to the field of devices and methods for exposing the source material intended for pattern formation, in particular the source material for printing plates, and more specifically to exposing the reverse side of the source material for printing plates. A device for exposing the source material (P), intended for pattern formation, which contains a substrate layer and at least one photosensitive layer, said device contains a supporting structure (10) for transferring the source material, a LED matrix (20) configured to irradiate the photosensitive layer of source material carried by the supporting structure, wherein the LED matrix is configured to simultaneously irradiate a given surface area with a size of at least 900 cm², the LED matrix contains a plurality of subsets (25) of one or more LEDs (21), each from subsets with separate management; a control unit (40) for controlling a plurality of subsets (25) individually and in such a way that the difference in irradiation intensity values of a given surface area is within a given range.

EFFECT: improved control of the exposed area through the use of LEDs.

20 cl, 10 dwg