METHOD OF PRODUCING THIN FILMS BASED ON INDIUM-TIN OXIDE BY ROTATING SUBSTRATE Russian patent published in 2024 - IPC C01G15/00 C01G19/02 C01G1/02 C23C14/08 C23C14/34 

FIELD: manufacturing technology.

SUBSTANCE: invention relates to production of thin indium-tin oxide films on the surface of substrates of different nature. Method includes preparation of functional ink solution, containing metal cations In³⁺ and Sn⁴⁺ in an organic solvent, applying a thin film on a substrate by rotating the substrate at a rotation speed of 500–3,000 rpm for 5–300 s while dispensing 60–150 mcl of functional ink and subsequent thermal treatment of thin film. When preparing a functional ink solution, an aqueous solution of indium nitrate and tin chloride with a total concentration of metal cations of 0.001–0.1 mol./l is used, note here that molar content of tin dioxide in the thin film is in range of 5–15%. Further, while stirring, an aqueous solution of ammonia hydrate is added to the obtained system until the system reaches pH=7. Obtained precipitate is dispersed in water and subjected to hydrothermal treatment in an autoclave with capacity of 25 ml while heating to 180 °C with holding for 2 hours. Further, the precipitate is separated and dispersed in ethylene glycol while maintaining the weight fraction of the solid phase in the obtained functional ink at level of 5%.

EFFECT: obtaining thin films based on indium-tin oxide on the surface of substrates of different nature.

1 cl, 3 dwg, 6 ex