FIELD: printing.
SUBSTANCE: invention relates to a method for the production of thin films based on indium-tin oxide, using a method for micro-plotter printing on a surface of substrates in thermal decomposition of organometal precursors. The invention can be used in electronics, instrument making, radio engineering, gas sensorics, optics, power engineering, and other fields of science and technology, when forming structures based on indium-tin oxide, including those of complex geometry. The method for the production of thin film based on indium-tin oxide on a surface of substrate of glass or quartz includes mixing of solutions of indium alkoxoacetylacetonate and tin acetylacetonate in 1-butanol, application of a solution obtained by mixing of the mentioned solutions to a surface of pre-purified and defatted substrate, and thermal processing in oxygen-containing atmosphere. A solution of indium alkoxoacetylacetonate in 1-butanol with a concentration in the range of 0.001-1 mol/l is used for mixing. Mixing of solutions of tin acetylacetonate and indium alkoxoacetylacetonate in 1-butanol is carried out to obtain oxide of In2O3-xSnO2 composition, wherein x=5-15 mol.%. Application of the solution obtained by mixing of the mentioned solutions to the surface of the mentioned substrate is carried out to form film by a micro-plotter printing method, using, as a dispenser, a capillary with an inner diameter of 5-250 mcm, moving at a speed of 50-500 mm/min and an interval of 5-250 mcm. Before thermal processing, substrate with formed film is kept in gaseous ammonia atmosphere for 30 min. Subsequent thermal processing in oxygen-containing atmosphere of the mentioned substrate with formed film is carried out at 300-650°C for 0.5-24 h to obtain thin film based on indium-tin oxide.
EFFECT: obtainment of thin films based on indium-tin oxide on a surface of substrates, using a simple and economical micro-plotter printing method.
1 cl, 3 dwg, 10 ex
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