METHOD OF PRODUCING THICK FILMS BASED ON INDIUM-TIN OXIDE BY MICRO-EXTRUSION PRINTING Russian patent published in 2024 - IPC C23C18/12 C01G15/00 

Abstract RU 2829197 C1

FIELD: chemistry.

SUBSTANCE: invention relates to a method of producing thick indium-tin oxide films on the surface of substrates of various nature by micro-extrusion printing using a paste based on oxide nanoparticles and can be used in electronics, instrument making, radio engineering, gas sensorics, optics, power engineering and other fields of science and technology when forming structures based on indium tin oxide, including complex geometry. According to the method, a solution of indium nitrate and tin chloride is prepared in distilled water with a total concentration of metal cations of 0.001–0.1 mol./l, wherein starting from the molar content of tin dioxide in the thick film, then an aqueous solution of ammonia hydrate is added to the system while stirring until the system reaches pH = 7, after which by means of centrifugation the formed intermediate product is separated and washed, which is further subjected to drying until weight loss ceases and additional heat treatment, after which the powder is crushed and dispersed in α-terpineol in presence of ethylcellulose, mass fraction of solid phase in obtained functional ink is 5–35%, application of a thick film with the help of functional ink on the surface of the substrate is carried out by micro-extrusion printing using a needle as a dispenser with an inner diameter of 100–300 mcm at a speed of its movement of 50–500 mm/min with pitch of 50–500 mcm and a pulse duration with dispensing ink of 0.1–1.0 s, then drying is carried out for 12 hours in air, followed by thermal treatment of film at 300–600 °C for 0.5–24 hours.

EFFECT: invention, due to the absence of the need to apply several layers of material, provides a simplified method of producing thick films based on indium tin oxide, enables reproducible and targeted formation of oxide films of different geometry, which expands their application areas; enables to automate and increase the rate of formation of thick films based on indium tin oxide.

1 cl, 5 dwg, 10 ex

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RU 2 829 197 C1

Authors

Fisenko Nikita Aleksandrovich

Simonenko Nikolaj Petrovich

Simonenko Tatyana Leonidovna

Gorobtsov Filipp Yurevich

Mokrushin Artem Sergeevich

Kuznetsov Nikolaj Timofeevich

Dates

2024-11-08Published

2023-12-26Filed