NANOSTRUCTURE FORMING MECHANISM Russian patent published in 2024 - IPC H01L21/67 B82B1/00 

FIELD: performing operations.

SUBSTANCE: invention is used in vacuum filtration plants for production of nano- and microstructured materials. Essence of the invention consists in the fact that a substrate holder for a device for forming a nanostructure by a vacuum filtration method, placed in a Büchner funnel, is an open cylindrical housing – a cup, equipped with slots for placing a substrate, with a plate for placing a membrane polytetrafluoroethylene (PTFE) filter with a pore diameter of 200 nm, wherein the reverse side of the plate for placing the filter has a smooth blind hole for the installation of a screw for moving the plate relative to the housing, in the bottom of which a nut is fitted with an interference fit to the screw, and in the bottom of the housing and the plate for placing the filter there are through holes for vacuum pumping of the filtrate.

EFFECT: disclosed is a mechanism for forming a nanostructure.

1 cl, 8 dwg