FIELD: metallurgy.
SUBSTANCE: method involves subsequent vacuum deposition of metal and graphite on a substrate. Metal is deposited by thermal evaporation, and graphite is deposited by evaporation with a pulse arc discharge and deposition by means of compensated non-current foreclusters of carbon plasma with density of 5·1012-1·1013 cm-3, duration of 200-600 mcs, repetition frequency of 1-5 Hz, which is stimulated during deposition by inert gas in the form of an ion flow with energy of 150-2000 eV, which is directed perpendicular to flow of plasma foreclusters. After deposition is completed, annealing of the substrate is performed in nitrogen medium at the temperature of 150-500°C during 1-10 min. With that, a substrate from silicon with proper conductivity is used; and as metal, the metal chosen from the group containing cadmium is used; and composition from silver and nickel, and composition from silver, nickel and cadmium is used.
EFFECT: improving functional properties of material; enlarging the range of produced photo-sensitive nanomaterials.
13 dwg, 6 ex
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Authors
Dates
2013-11-27—Published
2012-06-04—Filed