DEVICE FOR PLASMA-CHEMICAL TREATMENT OF INNER CAVITY OF ONE-PARAMETER SURFACES OF THE SECOND ORDER Russian patent published in 2024 - IPC C03C23/00 H01J37/32 

Abstract RU 2832425 C1

FIELD: performing operations.

SUBSTANCE: invention relates to spark erosion machining and can be used in production of articles from quartz glass. Device for plasma-chemical treatment of inner cavity of one-parameter surface of the second order of quartz glass articles includes cylindrical electrodes with length equal to or greater than the length of the cavity of the second-order one-parameter surface. Coaxially to electrodes near arc discharge zone there are two solenoids connected in series in high-frequency electric circuit in phase with each other. One of the electrodes has a channel for supplying plasma-forming argon gas to the arc discharge zone.

EFFECT: development of device for plasma-chemical etching of inner cavity of one-parameter surfaces of the second order.

1 cl, 3 dwg

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RU 2 832 425 C1

Authors

Borisenko Dmitrii Nikolaevich

Kolesnikov Nikolai Nikolaevich

Fursova Tatiana Nikolaevna

Dates

2024-12-24Published

2024-04-19Filed