METHOD OF MANUFACTURING MEMS MICROMIRROR MATRIX Russian patent published in 2024 - IPC G02B26/08 

FIELD: microelectromechanical devices.

SUBSTANCE: invention relates to methods of manufacturing mobile MEMS devices. Method of manufacturing a MEMS micromirror matrix involves deposition of a metal layer of torsions, photolithography and etching of the layer of torsions, deposition of a reflecting layer, lithography and etching of the reflecting layer, etching of the second and first separation sacrificial layers. Before forming a layer of torsions, a layer of aluminium nitride is deposited on a substrate with layers of metal wiring, including the lower electrodes of the matrix and interlayer insulation from silicon oxide, photolithography and etching of contact windows in the layer of aluminium nitride, plasma-chemical deposition of silicon nitride layer, which is the first separating sacrificial layer, photolithography and etching of contact windows in the layer of silicon nitride and after formation of the topology of the layer of torsions, plasma-chemical deposition of the second separating sacrificial layer of silicon nitride, photolithography and etching of contact windows in the second layer of silicon nitride.

EFFECT: improved geometry of MEMS micromirrors and increased efficiency of their manufacturing.

1 cl, 9 dwg, 1 tbl