FIELD: optoelectronics.
SUBSTANCE: invention relates to optoelectronics and can be used in making thin-film displays, solar cells and other optical devices. Method of producing thin coatings based on zinc oxide doped with gallium oxide, comprising step-by-step implementation of a monolayer coating using alloying substances from zinc oxide with low specific resistance, compounds containing aluminium or gallium, while in an evacuated reactor up to 10-2 mm Hg, heated in the temperature range of 150 °C to 250 °C, first precursor, water, which reacts with functional groups on the substrate is poured, after which an excess amount of molecules of the first precursor, water, and volatile reaction products are removed, then a second precursor is poured, in the form of diethylzinc, which reacts with hydroxyl functional groups on the surface of the substrate, after which the excess amount of molecules of the second precursor – diethylzinc, and volatile reaction products are removed, as a result of which a monolayer of zinc oxide is formed on the surface of the substrate, after which molecules of the third precursor are poured, which is ozone, which reacts with the formed zinc oxide layer, after which the excess amount of molecules of the third precursor, ozone, and volatile reaction products are removed, molecules of the fourth precursor, which is trimethylgallium, are poured, and then excess amount of molecules of the fourth precursor – trimethylgallium, and volatile reaction products are removed.
EFFECT: providing the possibility of obtaining a thin-film coating based on zinc oxide doped with gallium oxide, with given properties.
1 cl, 2 dwg, 1 tbl, 1 ex
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Authors
Dates
2025-01-28—Published
2024-05-30—Filed