FIELD: chemical industry.
SUBSTANCE: method for producing an electrically conductive transparent thin-film coating of indium oxide and tin oxide on the surface of a substrate. Pairs of precursors in the form of tetraethyltin (C2H5)4Sn and ozone are supplied to a substrate placed in a vacuum reactor to form a tin oxide film through the chemical interaction of the mentioned precursors, and pairs of precursors are supplied in the form of ethyldimethylindium ((CH3)2In(C2H5) and ozone with the formation of an indium oxide film through the chemical interaction of these precursors. These chemical interactions are carried out in the temperature range from 250°C to 350°C. After the formation of each of these films, the vacuum reactor is pumped out. In particular cases of implementation of the invention, a 3D volumetric substrate is used as a substrate.
EFFECT: possibility of creating an electrically conductive thin-film coating of indium oxide and tin oxide, which is an optically transparent coating with a specified refractive index.
2 cl, 2 dwg, 1 ex
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