FIELD: plasma generation devices.
SUBSTANCE: invention relates to plasma engineering, in particular to devices for generating plasma using external ultrahigh frequency (UHF) electromagnetic fields, and can be used as a simple and reliable source of pure electrodeless microwave discharge for carrying out intensive plasma-chemical and thermal technological processes of long duration at atmospheric pressure. Above technical result is carried out as follows: The microwave plasmatron has a microwave radiation source, a hollow rectangular feed waveguide connected to a section of a cylindrical waveguide. One end of the section of the cylindrical waveguide is also connected to a section of the cylindrical beyond the limit waveguide, and the other end is equipped with a branch pipe for supplying plasma-forming gas. Rectangular supply waveguide is connected perpendicularly to the side wall of the resonant-length cylindrical waveguide section short-circuited at both ends. And the distance from the axis of the rectangular waveguide to the other end of the cylindrical waveguide is equal to half the wavelength of the mode E01 in the cylindrical waveguide. In addition, the diameter and length of the short-circuited section of the cylindrical waveguide are selected as necessary to implement the resonance condition simultaneously for two or more types of oscillations in it, and the plasma-forming gas outlet occurs only through the cylindrical out-of-limit waveguide. Finally, the plasma-forming gas feed pipes can be located on the lateral cylindrical surface of the waveguide.
EFFECT: increased reliability of microwave plasmatron device by formation of plasma discharge along axis of cylindrical beyond-limit waveguide, connected from outside and coaxially to one of short-circuited ends of cylindrical waveguide of resonance length, due to connection of rectangular supply waveguide perpendicular to its axis at a distance from axis of rectangular supply waveguide to other end of cylindrical waveguide of resonance length, equal to half the wavelength of the E01 mode in the cylindrical waveguide, as well as due to the fact that the plasma-forming gas is released only through the cylindrical beyond the limit waveguide.
2 cl, 1 dwg
Title | Year | Author | Number |
---|---|---|---|
MICROWAVE PLASMATRON | 2019 |
|
RU2718715C1 |
MICROWAVE PLASMA REACTOR FOR GAS-PHASE DEPOSITION OF DIAMOND FILMS IN GAS FLOW (VERSIONS) | 2014 |
|
RU2595156C2 |
ULTRA HIGH-FREQUENCY PLASMATRON | 2004 |
|
RU2274963C2 |
MICROWAVE PLASMATRON AND PLASMA GENERATION METHOD | 2023 |
|
RU2826447C1 |
MICROWAVE WAVEGUIDE PLASMATRON FOR CREATION OF DISCHARGES AT ATMOSPHERIC PRESSURE | 2024 |
|
RU2837570C1 |
MICROWAVE PLASMOTRON | 0 |
|
SU868845A1 |
INTERFERENCE SWITCH OF RESONANCE SHF COMPRESSOR | 2008 |
|
RU2387055C1 |
RESONANT MICROWAVE COMPRESSOR WITH SYMMETRICAL RESONATOR | 2011 |
|
RU2470420C1 |
PLASMA CONVERTER USED FOR TRANSFORMATION OF THE GASEOUS AND LIQUID HYDROCARBON RAW AND THE FUELS INTO THE SYNTHESIS GAS ON THE BASIS OF THE MICROWAVE DISCHARGE | 2006 |
|
RU2318722C2 |
COMPRESSOR OF MICROWAVE PULSES | 2011 |
|
RU2451390C1 |
Authors
Dates
2025-04-24—Published
2024-05-31—Filed