ULTRA HIGH-FREQUENCY PLASMATRON Russian patent published in 2006 - IPC H05H7/00 

FIELD: engineering of devices for generating high temperature plasma, in particular, engineering of ultra high frequency plasma sources, possible use for plasma processing of various materials and products.

SUBSTANCE: ultra-high frequency plasmatron contains rectangular and round wave ducts connected to each other, dielectric chamber, UHF power absorber, UHF generator. Between UHF generator and connection of round and rectangular wave ducts slit bridge is inserted. Connection of round and rectangular wave ducts is made in form of wave duct - slit transition. In position of connection of round and rectangular wave ducts E-filter is mounted in form of hollow metallic rod adjustable along immersion depth along axis of round wave duct.

EFFECT: even combustion of charge along section of discharge chamber, generator is protected from reflected wave.

2 cl, 2 dwg