METHOD FOR VACUUM PLASMA PRODUCTION OF HYDROPHOBIC LAYERS WITH NANOMETRE THICKNESS Russian patent published in 2025 - IPC C23C16/28 C23C16/50 

FIELD: chemistry.

SUBSTANCE: invention relates to a method for vacuum plasma production of a hydrophobic fluorine-containing coating with nanometre thickness on substrates made from coarse calico or silicon. Said substrates are loaded into the reaction chamber onto a substrate holder, the reaction chamber is evacuated, octafluorocyclobutane is fed therein and plasma deposition of the hydrophobic coating is carried out. Plasma deposition of the hydrophobic coating is carried out from 30 seconds to 10 minutes at a pressure in the reaction chamber from 0.7 Pa to 5 Pa, temperature of the substrate holder of 20 °C, consumption of octafluorocyclobutane in range from 5 to 20 cm³/min and bias voltage on substrate holder from -10 to -15 V. Said bias voltage on the substrate holder is provided by supplying the substrate holder with power at frequency of 13.56 MHz from a separate generator and power absorbed in the discharge in range of 250-1250 W. Power is fed to the plasma generator from a high-frequency generator operating at frequency 6.78 MHz. Plasma deposition of the hydrophobic coating is carried out while controlling the temperature of the substrate holder using a thermocouple, wherein said substrate holder is located at distance of 15 cm from the discharge initiation zone.

EFFECT: obtaining a hydrophobic fluorine-containing coating with a nanometre thickness with a wetting angle of the surface of coarse calico or silicon of not less than 130°.

2 cl, 5 dwg, 2 ex