FIELD: electronic devices. SUBSTANCE: first aluminium layer is applied to phosphor substrate at a rate of (1.0- 1.5)10-3 mcm/s and residual gas pressure 6,65·10-4-6,65·10-3 Pa. Organic film is removed at 1-5 times alternating heat treatment at 300-380 C and residual gas pressure 1,33·10-3-1,1·10-2 Pa for 2-9 minutes involving glow-discharge plasma treatment at specific power on workpiece surface 25-100 W/sq.cm and residual gas pressure 6.65-133 Pa for 1-5 minutes. Second aluminium layer is applied at a rate of (3-5)·10-3 mcm/s at substrate temperature of 100-140 C and residual gas pressure 1,33·10-3-1,33·10-4 Pa or in inert gas at pressure 1,33-1,33·10-4 Pa, for example, in helium flow with impurities content 5·10-4-5·10-8 volume percent. EFFECT: increased output of serviceable products. 3 cl
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Authors
Dates
1995-10-27—Published
1986-11-24—Filed