FIELD: vacuum treatment of materials. SUBSTANCE: device has substrate holder 1, evaporator 3 mounted opposite to the former, vapor flow generator 4 built up of coaxial truncated cones 5 whose walls 6 form ducts 7 for vapor outlet. Uniform coating is obtained on fixed substrate along with reduced quantity of evaporated coating material is obtained due to coincidence of center line of generator 4 with center of substrate holder 1, convergence of center lines of ducts 7 in circular zone of substrate holder 1 whose radius equals (0.6-0.9)R, where R is radius of substrate holder 1, arrangement of substrate holder 1 at distance L greater than or equal to 2R from generator 4, and 1.1-1.4 times reduction of length of walls 6 of adjacent channels 7 from center to periphery. EFFECT: improved quality of coating, increased utilization factor of coating material. 2 cl, 1 dwg
Title | Year | Author | Number |
---|---|---|---|
EVAPORATOR | 1985 |
|
SU1354761A3 |
FILM VACUUM DEPOSITION PROCESS | 1987 |
|
SU1584433A3 |
EVAPORATOR | 1988 |
|
SU1600383A1 |
METHOD OF PLASMA APPLYING COATING IN VACUUM | 1982 |
|
SU1069451A3 |
DEVICE FOR FILM COATING IN VACUUM | 1982 |
|
SU1077334A1 |
FORMATION OF METAL-OXIDE FILMS OF HIGH-TEMPERATURE SUPERCONDUCTORS | 1989 |
|
SU1658656A3 |
EVAPORATOR | 1988 |
|
SU1605575A1 |
EROSION PLASMA ACCELERATOR | 1982 |
|
SU1088639A1 |
EVAPORATOR FOR DRY VACUUM RESISTORS | 0 |
|
SU1812237A1 |
REDUCED HEAT REMOVAL INTERNAL COMBUSTION ENGINE AND METHOD OF ITS MANUFACTURE | 1996 |
|
RU2168039C2 |
Authors
Dates
1994-06-30—Published
1987-08-20—Filed