FILM VACUUM DEPOSITION PROCESS Russian patent published in 1994 - IPC

FIELD: vacuum treatment technique. SUBSTANCE: procedure involves evaporation of deposited material in crucible whose inner space is hermetically joined with inner space of closed injection chamber; then crucible inner space is shut off the injection chamber, vapor is compressed, injected in vacuum for clustering and clusters formed in the process are ionized, accelerated, and condensed on substrate. This enables appreciable decrease in heating temperature of deposited material without reduction of coating quality so that the range of coating materials can be extended and new properties of coats obtained. EFFECT: enlarged manufacturing capabilities due to reduced heating temperature of deposited material while ensuring high degree of clustering of molecular vapor. 1 dwg