METHOD OF DETERMINATION OF CONCENTRATION OF ELECTRODES IN PLASMA GENERATED IN BEAM-PLASMA DEVICES Russian patent published in 1995 - IPC

FIELD: electrophysics. SUBSTANCE: potential of collector of electron beam is set negative relative to frame of decelerating SHF structure to ensure checking and control over concentration of electrons in plasma of beam-plasma SHF amplifier. Current of electron beam and current flowing through collector are measured and potential of collector is changed. When value of collector current exceeds value of beam current concentration of electrons is determined by results of measurements depending on parameters of beam and plasma electrons. EFFECT: improved authenticity of determination of concentration of electrons. 1 dwg