METHOD OF POLISHING OF SEMICONDUCTOR PLATES Russian patent published in 1995 - IPC

FIELD: polishing. SUBSTANCE: plates are pressed to the polisher and they are imparted relative rotation. The polisher is made of cloth nap-free material. Oil is applied to the polisher at least in two stages, in the first stage 110 to 180 ml of oil are applied per square meter of surface, and in subsequent stages oil is additionally applied at periodic inspection of deviation from smoothness, the amount of oil is determined by formula V= (5-8) S. h, where: S - the area of treated plates; h - the thickness of the layer removed from the plate surface. When plates of gallium arcenide are to be treated, the polisher rotational speed should be within 30 to 55 rpm, pressure of plates squeezing - within 55 to 80 g/sq.cm, and deviation from smoothness should be checked every 20 to 50 min. EFFECT: facilitated procedure. 2 cl