FIELD: semiconductor radiation sources. SUBSTANCE: layer of AlxGa1-xAs with thickness equal to summary thickness of emitters of heterostructure and layer of GaAs having thickness equal to thickness of contact layer are placed on surface of substate opposite to side of location of heterostructure with contact layer. EFFECT: improved stability of operational characteristics. 1 dwg
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Authors
Dates
1994-02-15—Published
1989-12-04—Filed