FIELD: optoelectronics. SUBSTANCE: photodetector built around quantum-well semiconductor structure has semi-insulating GaAs substrate with i-GaAs buffer layer, first n-GaAs contacting layer, system of alternating AlxGa1-xAs and GaAs layers, silicon admixture being introduced in one of alternating layers up to alloying level of 2·1018 см-3, and second n-GaAs contact layer; silicon admixture is introduced in AlxGa1-xAs layer in the form of monoatomic layer spaced at distance not greater layers. EFFECT: enlarged functional capabilities. 3 dwg
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Authors
Dates
1994-10-30—Published
1992-02-28—Filed