SENSOR OF GAS ANALYZER Russian patent published in 1995 - IPC

Abstract RU 2030738 C1

FIELD: measuring equipment. SUBSTANCE: sensor has silicon sublayer with through opening covered with a diaphragm from the working side of the sensor. The diaphragm is made of silicon dioxide. Film heater, dielectric layer, gas-sensitive semiconducting layer, and current-conducting contacts for the heater and gas-sensitive layer are arranged on the diaphragm in series. The opening is filled with oxidized porous silicone. The pore concentration of silicone decreases linearly with distance from the diaphragm interface over the depth of the opening from 6-20%. EFFECT: enhanced sensitivity. 1 dwg

Similar patents RU2030738C1

Title Year Author Number
METHOD OF MANUFACTURE OF SEMICONDUCTOR GAS SENSOR 1994
  • Skupov V.D.
  • Smolin V.K.
RU2065602C1
RESISTIVE GAS TRANSDUCER 1992
  • Zhukov G.F.
  • Smolin V.K.
RU2038589C1
PROCESS OF MANUFACTURE OF STRUCTURE "SILICON-SILICON DIOXIDE FILM" 1991
  • Skupov V.D.
  • Tsypkin G.A.
  • Aglaumov S.N.
  • Gudenko B.V.
RU2034365C1
METHOD FOR PRODUCING SILICON STRUCTURES WITH BURIED INSULATING LAYER 1998
  • Skupov V.D.
  • Smolin V.K.
RU2151446C1
PROCESS FORMING MEMBRANES IN MONOCRYSTALLINE SILICON SUBSTRATE 1995
  • Skupov V.D.
  • Perevoshchikov V.A.
  • Shengurov V.G.
RU2099813C1
MANUFACTURING TECHNIQUE FOR SILICON-ON-SILICON DIOXIDE FILM STRUCTURE 1996
  • Skupov V.D.
  • Smolin V.K.
RU2128382C1
SENSOR OF GAS COMPOSITION 1994
  • Gusev V.K.
RU2100800C1
PROCESS OF FORMATION OF FILM ELEMENTS ON BASE OF PLATINUM 1996
  • Smolin V.K.
  • Kondrashevskij V.P.
RU2110112C1
METHOD FOR STEAM-PHASE AND CHEMICAL PLASMA STIMULATION OF GAS-SENSING FILM DEPOSITION 1994
  • Gusev V.K.
  • Kondrashevskij V.P.
  • Samokhvalov R.V.
  • Donina M.M.
RU2087048C1
FLAW INSPECTION METHOD FOR INSULATING FILMS OF SEMICONDUCTOR STRUCTURES 1995
  • Skupov V.D.
RU2095885C1

RU 2 030 738 C1

Authors

Anisimov S.I.

Skupov V.D.

Shengurov V.G.

Dates

1995-03-10Published

1992-02-24Filed