FIELD: analytical instrumentation engineering; gas sensors. SUBSTANCE: substrate is placed in reactor, the latter is pre-evacuated, substrate is heated to 280-300 C, reactor is filled with mixture of reactive gases (oxygen and tetraethyl tin). Proportion of oxygen to tetraethyl tin by volume is 0.2-3 to 1; substrate is exposed to high-frequency discharge of density from 0.1 to 0.4 W/sq.cm. EFFECT: improved sensitivity of film obtained to gases. 6 cl, 1 tbl
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