PROCESS OF GENERATION OF BEAM OF ACCELERATED PARTICLES IN TECHNOLOGICAL VACUUM CHAMBER Russian patent published in 1995 - IPC

FIELD: acceleration equipment. SUBSTANCE: process provides for ionization of gas in gas-discharge chamber of ion source and supply of accelerating voltage positive relative to potential of technological chamber and emission grid to one of electrodes of chamber. Ion-forming gas is supplied into gas-discharge chamber through emission grid by means of ejector or directly from technological vacuum chamber or from re-charge chamber located between source of ions and technological vacuum chamber. This prevents formation of zone with pressure increased relative to working pressure of gas but sufficient for electric puncture. EFFECT: enhanced productivity and reliability of plant generating beams of accelerated particles. 4 cl, 2 dwg