VACUUM ARC UNIT Russian patent published in 1995 - IPC

FIELD: production of electronic instruments. SUBSTANCE: vacuum arc unit has separator disposed in working chamber on the way of plasma flow between evaporator and substrate holder. Separator has a set of conical rings, whose generatrices are positioned in parallel one with respect to the other. All rings are faced towards evaporator with their large ends, with larger diameter of each ring at least being equal to smaller diameter of inner larger ring. Separator is further provided with disk hawing center coinciding with system axis. Diameter of disk is at least equal to minimum diameter of inner ring. The set of rings makes continuous barrier for particles moving in plasma flow along rectilinear path. Auxiliary solenoid positioned behind substrate holder provides for increased coefficient of passage of plasma flow charged component and coating growth rate. EFFECT: increased efficiency in removal of micro and macro drops and neutral particles, which deteriorate coating, from plasma flow. 3 dwg