VACUUM DEPOSITION SET Russian patent published in 1996 - IPC

Abstract RU 2068458 C1

FIELD: vacuum deposition technique. SUBSTANCE: set has housing 1, cover 2, magnetrons 3 provided with flat target cathodes 4, magnetic system 5, backing orientation mechanism 6 with disk 10. Set has motion mechanism made in the form of screw pair 8 and drive 9. Disk 10 is located perpendicularly to axis of motion mechanism. Planes of two target cathodes are located at an angle of 25 to 35 deg relative to plane of disk 10; one target cathode is mounted in center of cover in parallel with plane of disk 10. EFFECT: enhanced efficiency. 1 dwg, 1 tbl

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RU 2 068 458 C1

Authors

Golovko V.A.

Diul'Skij M.A.

Fakhrutdinov Eh.G.

Dates

1996-10-27—Published

1991-10-15—Filed