PLANAR MAGNETRON WITH A ROTARY CENTRAL ANODE Russian patent published in 2023 - IPC H01J25/50 H01J37/02 C23C14/35 

FIELD: composite coatings.

SUBSTANCE: invention relates to the technique of applying composite coatings by carrying out non-equilibrium plasma-chemical processes that combine ion sputtering in a magnetron discharge and ion beam sputtering. It can be used for applying superhard coatings for multifunctional purposes, in particular, shock-, wear-, heat-, crack- and corrosion-resistant. The planar magnetron contains a central anode sputtered by an ion beam, an annular anode, a cathode, annular magnets, a high-voltage rectifier, and a plasma-forming gas puffing system. A through hole is made in the magnetron coaxially with its symmetry axis, a rod is installed coaxially in the hole with the possibility of axial rotation at a speed of 6.28 rad/s, holding the central anode at an angle of 45-50° relative to the direction of the sputtering ion beam on the central anode, and the axis of rotation of the central anode coincides with the axis of symmetry of the ion beam, the rod and the central anode are electrically connected to the annular anode.

EFFECT: increased efficiency of the process by optimizing the combination of functions of the central anode as a target sputtered by an ion beam and expanding the functionality of a planar magnetron in the synthesis of nanostructured composite coatings for multifunctional purposes.

1 cl, 5 dwg