MAGNETRON SPUTTERING DEVICE Russian patent published in 2023 - IPC H01J27/04 H01J37/36 C23C14/36 

FIELD: deposition of coatings on products in a vacuum chamber.

SUBSTANCE: invention is intended for obtaining products with superhard coatings with improved adhesion and low coefficient of friction by adding alloying element atoms to the sputtered magnetron target atoms deposited on the product. The magnetron sputtering device contains a flat round target, which is a glow discharge cathode, a magnetic system, one of the poles of which is adjacent to the center of the outer surface of the target, and its second pole is adjacent to the periphery of the outer surface of the target, a vacuum chamber, which is the glow discharge anode, a glow discharge power source connected with the negative pole to the target, and with the positive pole to the vacuum chamber. The device is equipped with a disk made of alloying element material concentric with the target and fixed onto it.

EFFECT: expansion of operational capabilities by varying the alloying element of the target and controlling the content of its atoms in the flow of target atoms to the substrate, as well as reducing the cost of manufacturing targets.

1 cl, 1 dwg