FIELD: microelectronics; manufacture of combined logic superlarge-scale CMOS integrated circuits of superlow power requirement. SUBSTANCE: complementary bipolar NAND gate which is functional integrated circuit compatible with CMOS technology has newly introduced first and second p-n-p loading transistors whose bases are combined and connected to circuit output with the result that p-n-p loading transistors function at cut-off barrier and do not consume current from power supply when at least one of circuit inputs is placed at logical 0 voltage. Proposed circuit uses functional integration of semiconductor regions of all circuit transistors and standard CMOS technology for its manufacture. Low-resistance n+ substrate is introduced to reduce current gain of parasitic p-n-p transistor and parasitic resistance Rx of n substrate. Circuit is set up on insulating substrate which eliminates P+ regions around it causing parasitic current leakage and stray capacitances as well as volumetric and surface regions wherein charge carrier generation caused by radiation may develop. EFFECT: reduced power requirement, facilitated manufacture and reduced cost, reduced parasitic effect of "latching", improved speed and radiation resistance. 3 cl, 4 dwg
Title | Year | Author | Number |
---|---|---|---|
COMPLEMENTARY BIPOLAR NAND GATE | 1994 |
|
RU2073935C1 |
COMPLEMENTARY NOR GATE AND ITS CIRCUIT ARRANGEMENT | 1994 |
|
RU2094911C1 |
BICMOS DEVICE AND PROCESS OF ITS MANUFACTURE | 1996 |
|
RU2106719C1 |
SEMICONDUCTOR STRUCTURE OF LOGICAL ELEMENT AND-NOT | 2010 |
|
RU2444086C2 |
INJECTION NAND GATE | 0 |
|
SU1744738A1 |
COMPLEMENTARY SEMICONDUCTOR DEVICE | 1997 |
|
RU2192691C2 |
MEMORY CELL BASED ON THIN-LAYER NANOSTRUCTURE | 2010 |
|
RU2444806C2 |
METHOD FOR MANUFACTURING COMPLEMENTARY VERTICAL BIPOLAR TRANSISTORS AS PARTS OF INTEGRATED CIRCUITS | 2003 |
|
RU2244985C1 |
INTEGRAL LOGICAL AND-NOT ELEMENT BASED ON LAYERED THREE DIMENSIONAL NANOSTRUCTURE | 2010 |
|
RU2452058C2 |
BIPOLAR CMOS DEVICE AND ITS MANUFACTURING PROCESS | 2003 |
|
RU2282268C2 |
Authors
Dates
1997-10-27—Published
1993-08-05—Filed