FIELD: semiconductor electronics and microelectronics; multipurpose devices. SUBSTANCE: proposed semiconductor device has structure that enables its functioning depending on connection of device leads as complementary n MOS and p MOS transistors, or as complementary bipolar n-p-n and p-n-p transistors, or as two new complementary components each provided with two control electrodes, and also as double-emitter transistor, thyristor, and as current-merged logic gate. EFFECT: enlarged functional capabilities. 10 dwg
Title | Year | Author | Number |
---|---|---|---|
SEMICONDUCTOR DEVICE | 1994 |
|
RU2091908C1 |
BICMOS DEVICE AND PROCESS OF ITS MANUFACTURE | 1996 |
|
RU2106719C1 |
BIPOLAR CMOS DEVICE AND ITS MANUFACTURING PROCESS | 2003 |
|
RU2282268C2 |
CMOS-TRANSISTOR WITH VERTICAL CHANNELS AND COMMON GATE | 2012 |
|
RU2504865C1 |
METHOD FOR MANUFACTURING PLANAR MOS POWER TRANSISTOR | 2002 |
|
RU2239912C2 |
METHOD OF MANUFACTURING SELF-COMBINED BICMOS STRUCTURE OF SUBMICROMETER SIZES | 2006 |
|
RU2329567C1 |
INTEGRATED CURRENT-MAGNETIC SENSOR INCORPORATING LIGHT-EMITTING DIODE DISPLAY | 2005 |
|
RU2300824C1 |
METHOD OF MAKING SEMICONDUCTOR DEVICE | 2015 |
|
RU2580181C1 |
METHOD OF CMOS TRANSISTORS MANUFACTURING WITH RAISED ELECTRODES | 2006 |
|
RU2329566C1 |
CMOS INTEGRATED CIRCUIT MANUFACTURING PROCESS | 1992 |
|
RU2051443C1 |
Authors
Dates
2002-11-10—Published
1997-01-09—Filed