VACUUM-ARC SOURCE OF PLASMA Russian patent published in 2010 - IPC C23C14/35 H05H1/50 

Abstract RU 2382118 C1

FIELD: electricity.

SUBSTANCE: source comprises evaporated metal cathode (2), anode (1), such as vessel, device for ignition of discharge and current distributor, which connects source of discharge power supply with cathode (2) on the side, which is opposite to its working surface. Current distributor is a facility of cathode spot stabilisation on working surface of cathode and is arranged in the form of conductor (10) as spatial helical line with angle of turns rise that does not exceed 20°. Device of discharge ignition comprises igniting electrode (9). Device includes additional facility for stabilisation of cathode spot in the form of electromagnetic coil (11) or circular electrostatic screen installed coaxially to cathode. On device body there is focusing electromagnetic coil (12) installed. Cathode (2) and current distributor are equipped with system of forced cooling.

EFFECT: improved reliability of vacuum-arc source of plasma, stability of erosion plasma flows generation, simplified design of device and increased energy efficiency of plasma generation.

10 cl, 3 dwg

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RU 2 382 118 C1

Authors

Zelenkov Vsevolod Viktorovich

Plikhunov Vitalij Valentinovich

Petrov Leonid Mikhajlovich

Ivanchuk Svetlana Borisovna

Gushchin Gennadij Arkad'Evich

Sokolov Igor' Viktorovich

Dates

2010-02-20Published

2009-01-28Filed