FIELD: carbon coatings. SUBSTANCE: invention is designed for micro- and optoelectronics when manufacturing devices registering heat and light emission, writing and reading information. Substrate is secured on movable jig in discharge-type microwave-frequency plasma-chemical installation, evacuated to 2.10-3 Pa, after which working gas is introduced - pure hydrocarbons - and microwave discharge is allowed providing conditions of exothermic chain reaction. Substrate is removed from reaction zone - conformal diamond-like carbon coating is obtained with hydrogen content not higher than 10 at.% distinguishing be sharp rise in conductivity at temperature above 350 C. Width of forbidden zone is 3.45 eV. Film exhibits cathode luminescence with intensity 8000 conventional units at wavelength 465 nm. EFFECT: improved quality of coating. 4 dwg
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