METHOD OF GAS CLEANING Russian patent published in 1998 - IPC

Abstract RU 2121881 C1

FIELD: gas cleaning. SUBSTANCE: method is based on passage of gas flow to be cleaned with high-resistance dust through an AC electric field induced between flat settling electrodes coated with a layer of dielectric. The interelectrode gap is filled with a negative space charge obtained at extraction of negatively charged components from the plasma zones of barrier discharge set up in a system of plane-parallel electrodes coated with dielectric and installed along the field lines. To enhance the efficiency of cleaning, chemical reagent is fed to the discharge zones so as to obtain electronegative components within plasma with a high affinity for electron. The space charge acts on dipole moments of aerosol particles causing their settling on the settling electrodes. EFFECT: enhanced efficiency of settling of aerosols of liquid polar dielectrics, fogs of aggressive media inclusive; enhanced reliability of protection of structural members against corrosion; enhanced service life. 3 cl, 1 dwg, 1 tbl

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RU 2 121 881 C1

Authors

Chistjakov Jurij L'Vovich

Dates

1998-11-20Published

1997-07-10Filed