GAS CLEANING APPARATUS Russian patent published in 1999 - IPC

FIELD: cleaning of gases from dust. SUBSTANCE: gas cleaning apparatus has source of alternating high voltage, system of plate plane-parallel precipitation electrodes which working surface is perforated and coated by dielectric. Precipitation electrodes are installed along flow of gas at variable distance between them thus ensuring alternation of disruptive gap to generate discharge plasma and main working gaps in specified numerical relation. Main working gap is filled with unipolar negative bulk charge produced due to extraction of charge carriers from zone of discharge plasma. EFFECT: increased corrosion resistance of apparatus in corrosive media and enhanced efficiency of trapping of dust. 2 cl, 2 dwg