METHOD OF GAS CLEANING Russian patent published in 1997 - IPC

Abstract RU 2098191 C1

FIELD: gas cleaning. SUBSTANCE: gas flow to be cleaned is passed through an AC electric field between flat precipitating electrodes coated by a layer of homogeneous dielectric. The interelectrode gap is filled with a unipolar space charge obtained due to extraction of negative charge carriers from the zone of the "barrier" charge excited between the main precipitating electrode and auxiliary electrode coated by a layer of homogeneous dielectric and perforated over the working surface. EFFECT: facilitated procedure. 1 dwg

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RU 2 098 191 C1

Authors

Chistjakov Jurij L'Vovich

Dates

1997-12-10Published

1996-03-06Filed