FIELD: coatings for glassware. SUBSTANCE: invention aims at preventing liquid silicon from dissolution in crucible body resulting in destruction of the latter because of difference in thermal expansion coefficients. Coating is applied by thermal deposition of silicon in vacuum chamber under nitrogen atmosphere at 10-5 Torr pressure while simultaneously inducing silicon nitride synthesis by irradiation of layer being deposited with low-energy nitrogen ions with energy up to 10 keV, ion current density up to 50 mcA/sq.cm, and substrate temperature up to 700K. EFFECT: achieved formation of poreless release coating on crucible surfaces.
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Authors
Dates
1998-11-20—Published
1997-05-27—Filed