METHOD OF APPLYING SILICON NITRIDE-BASED COATING ON GLASS, IN PARTICULAR, QUARTZ, SURFACE Russian patent published in 1998 - IPC

Abstract RU 2121985 C1

FIELD: coatings for glassware. SUBSTANCE: invention aims at preventing liquid silicon from dissolution in crucible body resulting in destruction of the latter because of difference in thermal expansion coefficients. Coating is applied by thermal deposition of silicon in vacuum chamber under nitrogen atmosphere at 10-5 Torr pressure while simultaneously inducing silicon nitride synthesis by irradiation of layer being deposited with low-energy nitrogen ions with energy up to 10 keV, ion current density up to 50 mcA/sq.cm, and substrate temperature up to 700K. EFFECT: achieved formation of poreless release coating on crucible surfaces.

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RU 2 121 985 C1

Authors

Bovbel' E.V.

Val'Dner V.O.

Epifanovskij I.S.

Zabolotnyj V.T.

Rudnik S.D.

Starostin E.E.

Tereshin S.A.

Shirjaev A.V.

Dates

1998-11-20Published

1997-05-27Filed