METHOD FOR OBTAINING NANOSIZED FILMS OF TITANIUM NITRIDE Russian patent published in 2022 - IPC C23C14/18 C23C14/26 B82Y30/00 

FIELD: metallurgy.

SUBSTANCE: invention relates to the field of applying protective coatings in metallurgy and engineering. The method for obtaining nanosized films of titanium nitride on a substrate of quartz optical glass is carried out as follows. Thermal spraying is carried out by resistive evaporation using a tungsten evaporator in the form of a wire with a portion of titanium attached to it at a residual pressure of (1.3-2) 10-4 Pa until its complete evaporation. The thickness of the deposited layer is determined by the mathematical formula T=(M⋅sinθ)/(ρ⋅4⋅π⋅R²), where M is the total mass of the evaporated titanium sample, g, T is the thickness of the deposited titanium film, cm, θ is the angle of inclination substrate to the evaporator, deg,, ρ is the density of evaporated titanium, g/cm³, R is the distance from the evaporator to the substrate, cm. within 40-90 min.

EFFECT: obtaining films of titanium nitride with a thickness in the nanoscale range to increase the heat resistance and wear resistance of products.

1 cl, 2 ex, 1 dwg