FIELD: metallizing samarium monosulfide base semiconductor devices. SUBSTANCE: double-layer metal coat is applied to samarium monosulfide substrate ar substrate temperature of 100-200 C and at a rate of 10-20; first layer (chromium) is deposited directly on substrate for 50-100 s and second one, (cobalt), on chromium layer for 300-400 s. EFFECT: facilitated procedure. 2 dwg, 7 tbl
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Authors
Dates
1997-09-10—Published
1995-12-04—Filed