FIELD: plasma engineering; application of multi-layer coats in form of thin films made from metals, their oxides, nitrides and other compounds synthesized in the course of plasma chemical reactions on surfaces of articles made from dielectric materials.
SUBSTANCE: proposed device includes magnetron spraying system, power supply system for said magnetron system, gas bleeding-in system, vacuum system and the following components mounted in series: sluice chamber equipped with loading unit, vacuum seal, first reversible chamber, working chamber and second reversible chamber. Magnetron spraying system is mounted in working chamber which is additionally equipped with ion source with belt-type bundle covering the surface of work in way perpendicular to its motion at energy from 0.1 to 10 keV and density of ion flow of 1x1012-1x1015 particles xcm-2xs1 falling at angle of 20-70° relative to normal to surface. Ion source has magneto-conducting housing used as cathode with magnetic system and extended water-cooled anode, emission slot forming belt-type bundle and gas supply system located inside it. Gas supply system is made in form of supply passage cascade located in base of housing. Passages in each cascade are symmetrically divided in two. All passages have similar length. Distance between outlet holes does not exceed 40 mm.
EFFECT: enhanced efficiency of cleaning and activation of surfaces of articles.
7 cl, 9 dwg
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Authors
Dates
2005-09-27—Published
2004-06-08—Filed