SHF PLASMA-CHEMICAL REACTOR Russian patent published in 2000 - IPC

FIELD: physics. SUBSTANCE: SHF plasma-chemical reactor includes metal discharge chamber, unit to input SHF energy into chamber connected to upper bottom of discharge chamber and made in the form of two coaxial metal tubes. SHF adjustment element is located inside internal tube. Wall of external tube of input unit has one or several windows to which rectangular waveguides are linked. Lower bottom of discharge chamber carries platform to mount machined part for movement relative to bottom towards axis of chamber. Mobile pin electrode is positioned in side wall of discharge chamber. Nozzles for injection of working gas are located in side wall of discharge chamber close to its lower bottom and lower bottom has holes for egress of gas. According to one of versions of proposed reactor dielectric ring is placed between upper bottom of discharge chamber and input unit, in agreement with another version discharge chamber has diameter considerably exceeding diameter of external tube of input unit and is linked to it by means of adapter composed of metal body and metal enclosure of conical shape and dielectric ring is installed in plane of upper bottom of discharge chamber in clearance between them. EFFECT: increased operational reliability, raised SHF power and productivity. 4 cl, 2 dwg