UHF PLASMA-CHEMICAL REACTOR Russian patent published in 2006 - IPC H05H1/30 H05B7/18 

FIELD: engineering of plasma reactors with increased plasma capacity and increased electric energy value injected to discharge; possible use for direct restoration of metals from ores, ignition of electric-melting furnaces, synthesis of powder-like materials, spheroidizing of powders, precipitating of films, etc.

SUBSTANCE: UHF plasma-chemical reactor has means for feeding source material for gathering end product, feeding and intake of working gas, means for forming longitudinal magnetic field and UHF energy input. In inner pipe of UHF energy input assembly at its end, directed into discharge chamber, electric-conductive hollow insert is positioned, connected through pipe, smooth transition and central conductor of coaxial-wave transition to negative pole of voltage source, and central conductor is made in form of pipe and is connected to dosage device of source material, while means for primary positioning of source material and gathering end product is made in form of platform, mounted in mobile pipe, acting as an arc discharge anode.

EFFECT: removed known limitations on UHF energy injected into plasma discharge; substantial increase of the amount of said energy while maintaining absence of consumed materials and simple process control characteristic for UHF plasma devices.

1 cl, 2 dwg