METHOD FOR CONTROLLING THREE-DIMENSIONAL DISTRIBUTION OF PLASMA DENSITY IN MICROWAVE PLASMA SOURCE WITH ELECTRON-CYCLOTRON RESONANCE Russian patent published in 2000 - IPC

Abstract RU 2152663 C1

FIELD: plasma equipment, microelectronics. SUBSTANCE: method involves inducing traveling electromagnetic wave in microwave plasma source with electron-cyclotron resonance in at least two modes with identical azimuthal values, for example, H11 and E11. Then, method involves application of longitudinal permanent magnetic field, which intensity corresponds to electron-cyclotron resonance, and controlling three-dimensional distribution of plasma density by means of alteration of phase difference between said wave modes. EFFECT: increased control range. 1 dwg

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RU 2 152 663 C1

Authors

Kudrjashov S.A.

Jafarov R.K.

Dates

2000-07-10—Published

1998-09-02—Filed