SOURCE OF INTENSE FLOWS OF LOW-TEMPERATURE PLASMA WITH HIGH DEGREE OF IONISATION Russian patent published in 2019 - IPC H05H1/46 

Abstract RU 2695819 C1

FIELD: electricity; physics.

SUBSTANCE: invention relates to a source of intense wide-aperture (up to hundreds cm) plasma streams with high degree of ionisation with effective current of hundreds of amperes. Device can be used in high-current sources of ions, in microelectronics, nuclear physics and in a number of other plasma technologies. To create plasma in magnetic trap under conditions of electron-cyclotron resonance powerful electromagnetic radiation of millimeter range of waves is used. In the source of plasma flows, the gas feed system is made in the form of a multi-aperture system of tubes with independent supply of working gas. Besides, there is an additional magnetic coil limiting the transverse dimension of the plasma expanding from the trap.

EFFECT: technical result is possibility to control transverse distribution of gas flow and to form wide-aperture flow of plasma with necessary, including flat, transverse structure, which increases density of gas-discharge plasma.

1 cl, 2 dwg

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RU 2 695 819 C1

Authors

Golubev Sergej Vladimirovich

Izotov Ivan Vladimirovich

Razin Sergej Vladimirovich

Sidorov Aleksandr Vasilevich

Skalyga Vadim Aleksandrovich

Shaposhnikov Roman Anatolevich

Dates

2019-07-29Published

2018-07-30Filed