HIGH-INTEGRATION SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING PROCESS Russian patent published in 2000 - IPC

Abstract RU 2153210 C2

FIELD: computer engineering. SUBSTANCE: storage device has erasable programmable read-only cell in the form of column with floating gate and control gate. Cell is so thin that it is fully depleted. Control gate of erasable programmable read-only flash memory cell with separated gate or that of double-gate cell is made of p+--doped semiconductor material so that fully depleted cylinders enable expecting adequate pre-threshold behavior. EFFECT: improved reliability at sub-lithographic size of device. 10 cl, 12 dwg

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RU 2 153 210 C2

Authors

Kerber Martin

Dates

2000-07-20Published

1996-12-11Filed