METHOD OF PRODUCTION OF SILICON-CARBIDE SINGE CRYSTALS Russian patent published in 2000 - IPC

Abstract RU 2157864 C2

FIELD: semiconductor industry. SUBSTANCE: method includes dissolving in solvent at high excessive pressure of SiC powder or some other initial material and growing of single crystal on inoculating crystal. Method allows production of voluminous single crystals of silicon carbide. EFFECT: higher efficiency. 13 cl

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RU 2 157 864 C2

Authors

Rene Shtajn

Roland Rupp

Jokhannes Fel'Kl

Dates

2000-10-20Published

1996-07-17Filed