FIELD: deposition of films on substrates. SUBSTANCE: process specifically refers to deposition of homogeneous diamond films on substrates of large areas. In correspondence with invention radicals or ions of plasma are deposited from plasma generated through slit made in flat anode on to substrate placed under anode in parallel to it. Generated plasma can be D C plasma of glow discharge initiated in atmosphere of carbon-carrying gas. Deposition can be realized in process of movement of substrate. EFFECT: deposition of uniform films over entire surface of substrate, substrates of large areas included. 7 dwg
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