CYLINDRICAL MAGNETRON SPRAYING SYSTEM Russian patent published in 2001 - IPC

FIELD: application of coatings; applicable in formation of coatings on substrates of large length and small cross-section. SUBSTANCE: magnetron spraying system contains magnetic system consisting of permanent magnets 1 and magnetic circuit 2 with equispaced recesses located over length of circumference on side of holder. Width of recess τ₁ is equal to width of protection τ₂. Cylindrical holder 4 is installed in cylindrical plain bearings 3 on projections of magnetic circuit 2. Secured to internal surface of cylindrical holder 4 is cylindrical cathode-target 5. Cylindrical holder 4 has stop from one side and from other, it is connected with flange 6 to preclude longitudinal displacement of holder 4 and cathode-target 5 with respect to magnetic system. Opposite side of flange 6 has gear-wheel which serves for transmission of rotation from external drive (not indicated in Fig.). Substrate 7 is located along device axis and moved inside working chamber. Wall of chamber accommodating magnetron spraying system or cylindrical spiral located inside magnetron spraying system along axis of cathode-target serves as anode. EFFECT: extended process potentialities due to regulation of induction value. 7 dwg