MAGNETRON SPUTTERING SYSTEM Russian patent published in 2024 - IPC C23C14/35 C23C14/56 

FIELD: electricity; various technological processes.

SUBSTANCE: invention relates to a magnetron sputtering system. Said magnetron sputtering system comprises an anode, a cathode in the form of a body of revolution and a magnetic system consisting of a permanent magnet and a magnetic conductor. Side surface of the cathode is made at angle of 0–60° to axis of magnetron sputtering system and contains target material applied on it. On the external end side of the cathode there is a plate which performs the function of an electrostatic and profiling screen. Magnetic conductor and cathode are tightly connected with formation of space between them, in which there is a permanent magnet. Said magnetron spraying system is axially movable by lineal actuator.

EFFECT: possibility of application of coatings of high quality and accuracy of gradient thickness on the basis of fusible metals and alloys with low emissive capacity.

6 cl, 3 dwg