METHOD OF TREATMENT OF GROWN INGOTS OF SILICON SINGLE- CRYSTALS Russian patent published in 2002 - IPC

Abstract RU 2186887 C2

FIELD: methods of treatment of grown ingots of silicon single crystals; applicable in manufacture of single-crystal silicon wafers of photovoltaic module solar cells. SUBSTANCE: method includes determination of ingot crystallographic lanes by morphological characteristics of initial ingot and then, pseudosquaring of ingot with its subsequent calibration. EFFECT: improvement of ingot quality and reduction of its rejects and silicon irreversible losses. 1 dwg, 2 tbl

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RU 2 186 887 C2

Authors

Beringov Sergej Borisovich

Ushankin Jurij Vladimirovich

Shul'Ga Jurij Grigor'Evich

Dates

2002-08-10Published

2000-01-31Filed