FIELD: optical projection systems. SUBSTANCE: method for producing M x N thin-film controlled mirrors 401 includes following procedures: preparing substrate 310; coating substrate upper surface with thin-film layer meant for subsequent removal; producing M x N matrix of vacant spaces on thin-film layer meant for subsequent removal; depositing flexible layer; configuring flexible layer as M x N matrix of flexible members 335; forming switching devices 415 on substrate 310 of M x N matrix; depositing passivation layer 340 and etch-preventing layer 350, as well as selective passivation layer so as to open flexible members 335; sequentially forming second M x N matrix of second thin-film electrodes and M x N matrix of electrically shifted members 375 on top of each flexible member 335; forming M x N matrix of control structures; removing thin-film layer. In this way M x N matrix of switching devices for controlled mirrors 401 is produced on substrate 310 upon executing all high-temperature processes to prevent damage to active matrix caused by heat treatment thereby reducing probability of damage to matrix of switching devices 415 due to heat. EFFECT: reduced impact of high-temperature treatment on quality of optical projection system. 10 cl, 19 dwg
